Abstract: The stochastic effects in photoresist patterning is of great concern in the implementation of EUV lithography. The stochastic nature of EUV chemically amplified resist requires new modeling ...
This repository contains comprehensive implementations of algorithms from the classic textbook "Fundamentals of Computer Algorithms" (Second Edition) by Ellis Horowitz, Sartaj Sahni, and Sanguthevar ...
Abstract: As self-driving vehicles become more prevalent, the speed and accuracy of detecting surrounding objects through onboard sensing technology have become increasingly important. The YOLOv8-QSD ...
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